Semiconductor integrated circuits, such as LSI and Ultra LSI, are the heart of computers and electronic products, which have become infrastructure of today's economy and society. Mother plates are called hard mask blanks, used in photolithography process of the production of semiconductor integrated circuits and form ultra fine patterns with 90 nanometer width and below. ULCOAT developed low reflective mask blanks consist of metal chrome and chrome oxide ahead of the times.

Features

Hard mask blanks are the products which are formed from a chrome or molybdenum silicide based thin film on mainly quartz or soda-lime glass substrate and they are applied with photosensitive materials (resist for electron beam and laser, etc). There are two kinds of hard mask blanks: low reflectance chrome-film mask blanks and attenuated phase shift mask blanks.

Use

Hard mask blanks are used as lithography mother plates for a mask when producing LSIs.

Standards (in inches)

2.5 x 2.5, 3.0 x 3.0, 4.0 x 4.0, 5.0 x 5.0, 6.0 x 6.0, 7.0 x 7.0 inches

Pioneer of Low Reflectance Masks

Low reflectance chrome-film mask blanks that consist of metal chrome and chrome oxide are used by LSI makers around the world and we produced them as a pioneer. Also the product made super LSI possible for the first time.

Super Precise Low Reflectance Chrome-film Mask Blanks

Low reflectance chrome-film mask blanks which consist of metal chrome and chrome oxide are used by LSI makers around the world and we have been producing them as a pioneer. Also the product made super LSI possible for the first time.

Super Precise Low Reflectance Chrome-film Mask Blanks

Low reflectance chrome-film mask blanks demand low defect of sub-micron, pattern performance at a nano level(goodcross-sectional shape and edge roughness), highly accurate reflectance of surfaces, and optical transmittance distribution and low stress in the film etc.

Features

Attenuated phase shift mask blanks were developed to realize the fine pitch patterns of ULSIcircuitswhich beyond the optical exposure limit using traditional hard masks. ULCOAT develops and sells attenuated phase shift mask blanks as the mother plates of cutting-edge masks and responds to the needs of more and more precise and higher integrated semiconductors.

Ultra Precise Control of Optical Properties

Attenuated phase shift mask blanks need super accurate control of retardation and transmittance, in addition to the performance needed by low reflective Cr mask blanks.

About Attenuated Phase Shift Mask Blanks

Attenuated phase shift mask blanks are the products which form a translucent film on a synthetic quartz glass plate. Mainly molybdenum(Mo) and silicone(Si) are used for the chemical reactions to create the film. Oxidation and nitro-oxidation are used for the translucent film on a synthetic quartz glass plate.