Company History

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Company History

History of the current overview from the establishment

We will guide history of the current overview from the establishment of ULCOAT.

1970 Started development and prototype supply of hard mask blanks
1971 Started development of See Through mask (ST mask) blanks
1972 Began sales of low reflection chrome mask (MF mask) blanks
1973 Began exporting MF mask blanks to USA
1975 Began manufacturing and sales of transparent electro conductive film (ITO)
(all the above done at a division of ULVAC,Inc. the old name ULVAC JAPAN,Ltd.)
1979 Established Ulvac Coating Corporation
Capital to JPY100 Million, Relocated and constructed headquarter and factory (Bldg.A) in Chichibu-city.
1981 Constructed Building B
1982 Began sales of UF-MASK and PF-MASK blanks
1984 Constructed Building C
1986 Raised capital to JPY190 Million
Established IHT Corporation in USA as a joint corporation with Kyushu Shinku Yakin Co.,Ltd & Inabata & Co.,LTD.
Began sales & development of Dry Etching Machine for mask making
1987 Raised capital to JPY272 Million
1988 Started ITO-film patterning
Started BM (Black matrix-chrome film for the FPD Color Filter) Coating
1992 Installed Lithographic Machiine & started BM Patterning
1994 Constructed Building D
1995 Began manufacturing of Phase Shift Mask Blanks
1997 ISO 9002 certified (JICQA NO.0205)
Constructed Building E
1999 Began sales & manufacturing of NLDE Dry Etching for mask making
2000 Changed name from "IHT CORP." to "ULCOAT U.S.A.,Inc."
2001 ISO 14001 certified (JICQA NO.E217)
Established ULCOAT Taiwan,Inc.
2002 Switched from ISO 9002 to ISO 9001
Constructed headquarter and factory of ULCOAT Taiwan
Began R&D of GNF-FED (Field Emission Display)
2003 Began R&D of MEMS
2005 Expanded Bldg.D (LM production expansion with a new line)
2006 Integration of Quality and Environmental management system (ISO 9001 ・ ISO 14001)
ULCOAT U.S.A.,Inc. was dissolved to transfer their business for INABATA AMERICA CORPATION
Started sales glass MEMS products
2007 FP Dept. changed to FD (Functional Device) Dept. and began dealing mainly with glass MEMS
2009 Constructed Building G
2010 Began sales of Halftone (F type, T type) Mask Blanks for LCD application
2013 Reduce capital JPY172 Million (New capital to JPY100 Million)
2013 Began sales of Attenuation Phase Shift Mask Blanks for LCD application
2015 Began installation and generation of solar phtotoelectric equipment (Max. output 285.6kw) on the factory rooftop